Post-Doctoral fellowship in multi-scale modeling of the growth of polycrystalline thin films.

The objective of this postdoctoral position is to model the growth and microstructural evolution of polycrystalline metallic thin films by developing a numerical simulation code based on kinetic Monte Carlo (kMC) which considers the specificities of energetic physical vapor deposition (PVD) such as magnetron sputtering. It is part of the DREAM project funded by ANR and Région Nouvelle Aquitaine. To this end, the candidate will have to link the deposition parameters (deposited energy, particle flux, substrate temperature and the chemical reactivity at the substrate interface to the microstructure (grain size, texture) and morphology (roughness, faceting) evolution of the growing layer. Specific attention will be also placed on the creation of defects due to energetic bombardment in the polycrystalline metallic layer.