20 months

Multi-scale computational modelling of polycrystalline thin film growth during energetic sputter deposition process and study of the dependence between stress generation and deposition parameters

The aim of the Post-Doctoral position, as a part of the INTEGRAL project, is to implement a robust and reliable multiscale computational modelling of thin film growth over realistic time scales with the ultimate goal to address stress generation and relaxation processes into a single, multi-methods simulation package. This computational-driven approach is based on a kinetic Monte Carlo (kMC) scheme, which will encompass both on-lattice and off-lattice models to address all interdependent issues of defect creation, chemical intermixing and grain boundaries (GB) formation/migration during polycrystalline film growth. Specifically, the project will address fundamental aspects of the growth process of polycrystalline thin films with emphasis laid on the GB formation/evolution, surface faceting, stress relaxation and the defect creation/evolution related to energetic deposition process, as also the early growth stages such as interfacial reaction, nucleation and growth



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Département de Physique et Mécanique des Matériaux de l’Institut Pprime
CNRS • Université de Poitiers • ENSMA • UPR 3346
SP2MI • Téléport 2
Boulevard Marie et Pierre Curie • BP 30179

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